Nano-porous electrode systems by colloidal lithography for sensitive electrochemical detection: fabrication technology and properties
Creators
- 1. Department of New Materials and Biosystems, Max Planck Institute for Metals Research, Heisenbergstr. 3, D-70569 Stuttgart (Germany)
- 2. NMI Naturwissenschaftliches und Medizinisches Institut an der Universität Tübingen, Markwiesenstrasse 55, D-72770 Reutlingen (Germany)
- 3. Analytische Chemie–Elektroanalytik and Sensorik, Ruhr-Universität Bochum, Universitätsstr. 150, D-44780 Bochum (Germany)
- 4. Measurement Specialties/HL Planartechnik GmbH, Hauert 13, D-44227 Dortmund (Germany)
Description
A porous metal-insulator-metal sensor system was developed with the ultimate goal of enhancing the sensitivity of electrochemical sensors by taking advantage of redox cycling of electro active molecules between closely spaced electrodes. The novel fabrication technology is based on thin film deposition in combination with colloidal self-assembly and reactive ion etching to create micro- or nanopores. This cost effective approach is advantageous compared to common interdigitated electrode arrays (IDA) since it does not require high definition lithography technology. Spin-coating and random particle deposition, combined with a new sublimation process are discussed as competing strategies to generate monolayers of colloidal spheres. Metal-insulator-metal layer systems with low leakage currents < 10 pA and an insulator thickness as low as 100 nm were obtained at high yield (typically > 90%). We also discuss possible causes of sensor failure with respect to critical fabrication processes. Short circuits which could occur during or as a result of the pore etching process were investigated in detail. Infrared microscopy in combination with focused ion beam etching/SEM were used to reveal a defect mechanism creating interconnects and increased leakage current between the top and bottom electrodes. Redox cycling provides for amplification factors of >100. A general applicability for electrochemical diagnostic assays is therefore anticipated
Availability note (English)
Available from http://dx.doi.org/10.1088/0960-1317/18/11/115011Additional details
Identifiers
- DOI
- 10.1088/0960-1317/18/11/115011;
- PII
- S0960-1317(08)79735-3;
Publishing Information
- Journal Title
- Journal of Micromechanics and Microengineering. Structures, Devices and Systems
- Journal Volume
- 18
- Journal Issue
- 11
- Journal Page Range
- [11 p.]
- ISSN
- 0960-1317
- CODEN
- JMMIEZ
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44095701
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- AMPLIFICATION; COMPARATIVE EVALUATIONS; ELECTRICAL FAULTS; ELECTROCHEMISTRY; ELECTRODES; ETCHING; FABRICATION; ION BEAMS; LEAKAGE CURRENT; METALS; POROUS MATERIALS; SENSORS; SPIN-ON COATING; SUBLIMATION; THICKNESS; THIN FILMS
- Descriptors DEC
- BEAMS; CHEMISTRY; CURRENTS; DEPOSITION; DIMENSIONS; ELECTRIC CURRENTS; ELEMENTS; EVALUATION; EVAPORATION; FILMS; MATERIALS; PHASE TRANSFORMATIONS; SURFACE COATING; SURFACE FINISHING