UV Analysis of bottom gate thin film transistor using VisualTCAD
Creators
- 1. Department of Electronics and Communication Engineering Malaviya National Institute of Technology Jaipur (India)
Description
This paper reports the simulation results of bottom gate Thin-Film Transistor (TFT) having SiO2 as the insulating layer onto a p-type Si substrate with Zinc Oxide (ZnO) channel, using the modelling tool VisualTCAD by Cogenda. Under dark condition, the TFTs exhibited a saturation currents in the range of 20–120 μA, On/Off current ratio of 104, threshold voltages in the range of 1.18–1.32 V and the sub-threshold swings (S) in the range of 0.4–0.7 V/decade, for the different W/L ratios, under an applied gate bias of 2 V. The device behaviour has been further analyzed for its electrical response under UV light, with different optical intensities and wavelengths, for the optimized result of W/L at 30 μm/9 μm. The UV performance analysis of the TFTs, as a sensor, was done under a wide range of UV optical intensities, from 2.5–10 mW cm−2 and the wavelengths, from 100–300 nm. TFT for the optimized dimensions shows a photo-current gain of more than 150 μA, under similar gate bias voltage of 2 V. It shows that the photo-current increases with rising UV intensities and wavelengths. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/2053-1591/aaeae5Additional details
Identifiers
Publishing Information
- Journal Title
- Materials Research Express (Online)
- Journal Volume
- 6
- Journal Issue
- 2
- Journal Page Range
- [11 p.]
- ISSN
- 2053-1591
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 51095398
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- SILICA; SILICON OXIDES; THIN FILMS; TRANSISTORS; ULTRAVIOLET RADIATION; WAVELENGTHS; ZINC OXIDES
- Descriptors DEC
- CHALCOGENIDES; ELECTROMAGNETIC RADIATION; FILMS; MINERALS; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; RADIATIONS; SEMICONDUCTOR DEVICES; SILICON COMPOUNDS; ZINC COMPOUNDS