Published December 2, 2016 | Version v1
Journal article

Nanoscale tomographic reconstruction of the subsurface mechanical properties of low- k high-aspect ratio patterns

  • 1. Material Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, MD 20899 (United States)
  • 2. Logic Technology Development, Intel Corporation, Hillsboro, OR 97124 (United States)
  • 3. Components Research, Intel Corporation, Hillsboro, OR 97124 (United States)

Description

In this work, intermittent contact resonance atomic force microscopy (ICR-AFM) was performed on high-aspect ratio a-SiOC:H patterned fins (100 nm in height and width from 20 to 90 nm) to map the depth and width dependencies of the material stiffness. The spatial resolution and depth sensitivity of the measurements were assessed from tomographic cross-sections over various regions of interest within the 3D space of the measurements. Furthermore, the depth-dependence of the measured contact stiffness over the scanned area was used to determine the sub-surface variation of the elastic modulus at each point in the scan. This was achieved by iteratively adjusting the local elastic profile until the depth dependence of the resulted contact stiffness matched the depth dependence of the contact stiffness measured by ICR-AFM at that location. The results of this analysis were assembled into nanoscale sub-surface tomographic images of the elastic modulus of the investigated SiOC:H patterns. A new 3D structure-property representation emerged from these tomographic images with direct evidence for the alterations sustained by the structures during processing. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/0957-4484/27/48/485706

Additional details

Publishing Information

Journal Title
Nanotechnology (Print)
Journal Volume
27
Journal Issue
48
Journal Page Range
[9 p.]
ISSN
0957-4484

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
50039148
Subject category
S77: NANOSCIENCE AND NANOTECHNOLOGY;
Descriptors DEI
AMORPHOUS STATE; ASPECT RATIO; ATOMIC FORCE MICROSCOPY; CROSS SECTIONS; FLEXIBILITY; HYDRATES; NANOSTRUCTURES; OXYCARBIDES; SENSITIVITY; SILICON COMPOUNDS
Descriptors DEC
CARBON COMPOUNDS; DIMENSIONLESS NUMBERS; MECHANICAL PROPERTIES; MICROSCOPY; OXYGEN COMPOUNDS; TENSILE PROPERTIES