Investigation of molecular deposition reactions in the formation of boron phosphate on the surface of dispersed silica

The mechanisms of reactions of BPO4 formation on the surface of silica in the process of successive interaction of B(OCH3)3 and POCl3 with SiO2 (and modified SiO2) in the framework of cluster approximation by the MPDP method was studied. It is ascertained that molecules of B(OCH3)3 in contrast to POCl3 form stable prereactive complexes of donor-acceptor type, owing to the fact formation of boron oxide layer occurs in milder conditions as compared with phosphorus oxide one