Published April 1, 2006 | Version v1
Journal article

Time, energy, and spatially resolved TEM investigations of defects in InGaN

  • 1. Lawrence Berkeley National Laboratory, National Center for Electron Microscopy (NCEM), One Cyclotron Road, Blg. 72-125, LBNL, Berkeley, CA 94720 (United States)

Description

A novel sample preparation technique is reported to fabricate electron transparent samples from devices utilizing a FIB process with a successive wet etching step. The high quality of the obtained samples allows for band gap-and chemical composition measurements of In x Ga1-x N quantum wells where electron beam induced damage can be controlled and shown to be negligible. The results reveal indium enrichment in nanoclusters and defects that cause fluctuations of the band gap energy and can be measured by low loss Electron Energy Spectroscopy with nm resolution. Comparing our time, energy, and spatially resolved measurements of band gap energies, chemical composition, and their related fluctuations with literature data, we find quantitative agreement if the band gap energy of InN is 1.5-2 eV

Additional details

Identifiers

DOI
10.1016/j.physb.2005.12.136;
PII
S0921-4526(05)01524-3;

Publishing Information

Journal Title
Physica. B, Condensed Matter
Journal Volume
376-377
Journal Page Range
p. 536-539
ISSN
0921-4526
CODEN
PHYBE3

Conference

Title
23. international conference on defects in semiconductors
Dates
24-29 Jul 2005
Place
Awaji Island (Japan)

Optional Information

Copyright
Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.