Published June 2021 | Version v1
Journal article Metadata-only

Enhancement of the Corrosion Resistance of CrN Film Deposited by Inductively Coupled Plasma Magnetron Sputtering

Creators

  • 1. Mokpo National University, Muan (Korea, Republic of)
  • 2. Mokpo National Maritime University, Mokpo (Korea, Republic of)

Description

Inductively coupled plasma magnetron sputtering (ICPMS) has the advantage of being able to dramatically improve coating properties by increasing the plasma ionization rate and the ion bombardment effect during deposition. Thus, this paper presents the comparative results of CrN films deposited by direct current magnetron sputtering (dcMS) and ICPMS systems. The structure, microstructure, and mechanical and corrosive properties of the CrN coatings were investigated by X-ray diffractometry, scanning electron microscopy, nanoindentation, and corrosion-resistance measurements. The as-deposited CrN films by ICPMS grew preferentially on a 200 plane compared to dcMS on a 111 plane. As a result, the films deposited by ICPMS had a very compact microstructure with high hardness. The nanoindentation hardness reached 19.8 GPa, and 13.5 GPa by dcMS. The corrosion current density of CrN film prepared by ICPMS was about 9.8 × 10-6 mA/cm2 , which was 1/470 of 4.6 × 10-3 mA/cm2 , the corrosion current density of CrN film prepared by dcMS

Additional details

Publishing Information

Journal Title
Corrosion Science and Technology
Journal Volume
20
Journal Issue
3
Series
16 refs, 4 figs, 1 tab
Journal Page Range
p. 112-117
ISSN
1598-6462

INIS

Country of Publication
Korea, Republic of
Country of Input or Organization
Korea, Republic of
INIS RN
53091862
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
CHROMIUM NITRIDES; COATINGS; CORROSION; CORROSION RESISTANCE; CURRENT DENSITY; DEPOSITION; DIRECT CURRENT; FILMS; HARDNESS; ICP MASS SPECTROSCOPY; IONIZATION; MAGNETRONS; MICROSTRUCTURE; PLASMA; PRESSURE RANGE GIGA PA; SCANNING ELECTRON MICROSCOPY; SPUTTERING; X-RAY DIFFRACTION
Descriptors DEC
CHEMICAL REACTIONS; CHROMIUM COMPOUNDS; COHERENT SCATTERING; CURRENTS; DIFFRACTION; ELECTRIC CURRENTS; ELECTRON MICROSCOPY; ELECTRON TUBES; ELECTRONIC EQUIPMENT; EQUIPMENT; MASS SPECTROSCOPY; MECHANICAL PROPERTIES; MICROSCOPY; MICROWAVE EQUIPMENT; MICROWAVE TUBES; NITRIDES; NITROGEN COMPOUNDS; PNICTIDES; PRESSURE RANGE; SCATTERING; SPECTROSCOPY; TRANSITION ELEMENT COMPOUNDS