Published October 6, 2014 | Version v1
Journal article

Turn on of new electronic paths in Fe-SiO2 granular thin film

  • 1. Physics Institute–IF-UFRGS, C.P. 15051, 91501–970, Porto Alegre, Rio Grande do Sul (Brazil)
  • 2. Geosciences Institute–IG-UFRGS, C.P. 15001, 91501–970, Porto Alegre, Rio Grande do Sul (Brazil)
  • 3. Materials Metrology Division, INMETRO, 25250-020 Duque de Caxias, Rio de Janeiro (Brazil)

Description

The electrical properties of Fe-SiO2 have been studied in the low-field regime (eΔV ≪ kBT), varying the injected current and the bias potential. Superparamagnetism and a resistance drop of 4400 Ω (for a voltage variation of 15 V) were observed at room temperature. This resistance drop increased at lower temperatures. The electrical properties were described with the “Mott variable range hopping” model explaining the behavior of the electrical resistance and the electronic localization length as due to the activation of new electronic paths between more distant grains. This non-ohmic resistance at room temperature can be important for properties dependent of electrical current (magnetoresistance, Hall effect, and magnetoimpedance).

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
105
Journal Issue
14
Journal Page Range
p. 143112-143112.3
ISSN
0003-6951
CODEN
APPLAB

Optional Information

Notes
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