Published 1987
| Version v1
Book
Role of electron dissociative attachment and impact dissociation of HCl in XeCl lasers
Creators
- 1. North East Research Associates, 400 W. Cummings Park, Woburn, MA 01801
Description
A computer model of e-beam-pumped XeCl laser mixtures has been developed which uses a time-dependent Boltzman solution for the secondary electron distribution. The model and data indicate that electron dissociative attachment by itself cannot adequately explain the increase in the electron density toward the end of the pulse. The authors believe an additional HCl lost channel must exist. The model results are compared to the electron density and halogen depletion measurements. The results are used to help understand the relative importance of electron dissociative attachment and impact dissociation of HCl with regard to the halogen burnup issue
Additional details
Publishing Information
- Publisher
- IEEE Service Center.
- Imprint Place
- Piscataway, NJ (USA)
- Imprint Title
- Proceedings of the conference on lasers and electro-optics
- Journal Page Range
- p. 204.
Conference
- Title
- OSA/IEEE conference on lasers and electro-optics (CLEO '87).
- Dates
- 27 Apr - 1 May 1987.
- Place
- Baltimore, MD (USA).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 19024632
- Subject category
- S74: ATOMIC AND MOLECULAR PHYSICS;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CHEMICAL REACTION KINETICS; COMPUTERIZED SIMULATION; DISSOCIATION; DISTRIBUTION FUNCTIONS; ELECTRICAL PUMPING; ELECTRON DENSITY; ELECTRON-MOLECULE COLLISIONS; EXCIMER LASERS; HYDROCHLORIC ACID; MATHEMATICAL MODELS; PULSES; STIMULATED EMISSION; TIME DEPENDENCE; XENON CHLORIDES
- Descriptors DEC
- AMPLIFIERS; CHLORIDES; CHLORINE COMPOUNDS; COLLISIONS; ELECTRON COLLISIONS; EMISSION; ENERGY-LEVEL TRANSITIONS; EQUIPMENT; GAS LASERS; HALIDES; HALOGEN COMPOUNDS; HYDROGEN COMPOUNDS; INORGANIC ACIDS; INORGANIC COMPOUNDS; KINETICS; LASERS; MOLECULE COLLISIONS; RARE GAS COMPOUNDS; REACTION KINETICS; SIMULATION; XENON COMPOUNDS
Optional Information
- Notes
- Imprint:Technical Paper WR4.