Published 1997 | Version v1
Report

Physical processes in ECR plasma: development of high charge state ion sources for atomic and nuclear physics research

  • 1. Department of Atomic and Nuclear Physics, National Institute for Physics and Nuclear Engineering - Horia Hulubei, PO Box MG-6, RO-76900 Bucharest-Magurele (Romania)

Description

The development of ECR Ion Sources is a major preoccupation in many research laboratories. A better understanding of the physical processes occurring in the ECR plasma would allow obtaining high charge state ion beams with higher performances. A way to achieve high charge ion production is to enrich the electron population of the ECR plasma. A 14.5 GHz ECR Ion Source of intense and high charge state ion beams is under development in our Department. Structures with promising parameters were realized by developing technologies of obtaining special electron emissive surfaces for improved negative ion sources. Preliminary tests of this ECR Ion Source were performed at the Institute of Nuclear Physics of the J.W.Goethe University in Frankfurt, Germany and a program for co-operation concerning the ECR plasma physical processes was elaborated

Availability note (English)

Available from author(s) or from National Institute for Physics and Nuclear Engineering - Horia Hulubei, Str. Atomistilor No.109, PO Box MG-6, RO-76900 Bucharest (RO)
Part of:
NIPNE - Scientific Report 1996

Additional details

Publishing Information

Imprint Title
NIPNE - Scientific Report 1996
Imprint Pagination
286 p.
Journal Page Range
p. 113
Report number
NIPNE-AR--1997

INIS

Country of Publication
Romania
Country of Input or Organization
Romania
INIS RN
30040350
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
Resource subtype / Literary indicator
Non-conventional Literature, Progress Report
Descriptors DEI
CHARGE STATES; ECR ION SOURCES; ELECTRON DENSITY; GHZ RANGE 01-100; MULTICHARGED IONS; PLASMA; PROGRESS REPORT
Descriptors DEC
CHARGED PARTICLES; DOCUMENT TYPES; FREQUENCY RANGE; GHZ RANGE; ION SOURCES; IONS

Optional Information

Notes
Short communication