The influence of thermal treatment on the preparation of PMN and PMN-PT thin films

Ferroelectric thin films belong to a class of materials with great technological importance in optic fibers, microelectromechanical systems, and microprocessors and computers memories. The (1-x)PbMg1/3Nb2/3O3(x)PbTiO3 (PMN-PT) thin films, with x=0, 0.1, 0.35 and 0.5, were prepared by Pechini's process and deposited by spin-coating on Si(100), Pt/Ti/SiO2/Si(100) and quartz substrates. The goal of the present paper is to verify the thermal treatment influence on the perovskite phase formation, which is desirable for these applications. The phase formation was analyzed by X-ray diffraction. The film's surface was characterized by atomic force microscopy to analyze the roughness and the homogeneity. The results of this study indicate that the optimum conditions for obtaining the perovskite phase using a Pt/Ti/SiO2/Si(100) substrate, were drying each deposited layer at 140 deg. C (heating plate), and a final thermal treatment at 600 deg. C for 3 h in a closed system with a lead-rich atmosphere