Published October 2009 | Version v1
Journal article

Defect evolution of nanocrystalline SnO2 thin films induced by pulsed delivery during in situ annealing

  • 1. Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon Tong (Hong Kong)
  • 2. Shanghai Applied Radiation Institute, Institute of Nanochemistry and Nanobiology, School of Environmental and Chemical Engineering, Shanghai University, Shanghai 200444 (China)

Description

The microstructural defects of nanocrystalline SnO2 thin films prepared by pulsed laser deposition have been investigated using transmission electron microscopy, high-resolution transmission electron microscopy and Raman spectroscopy. Defects inside nanocrystalline SnO2 thin films could be significantly reduced by in situ annealing SnO2 thin films at 300 deg. C for 2 h. High-resolution transmission electron microscopy showed that the stacking faults and twins were annihilated upon in situ annealing. In particular, the inside of the SnO2 nanoparticles demonstrated perfect lattices free of defects after in situ annealing. Raman spectra also confirmed that the in situ annealed specimen was almost defect-free. By using in situ annealing, defect-free nanocrystalline SnO2 thin films can be prepared in a simple and practical way, which holds the promise for applications as transparent electrodes and solid-state gas sensors.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.actamat.2009.07.014

Additional details

Identifiers

DOI
10.1016/j.actamat.2009.07.014;
PII
S1359-6454(09)00432-7;

Publishing Information

Journal Title
Acta Materialia
Journal Volume
57
Journal Issue
17
Journal Page Range
p. 5078-5082
ISSN
1359-6454
CODEN
ACMAFD

Optional Information

Copyright
Copyright (c) 2009 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.