Velocity distribution of ions incident on a wafer in two frequency capacitively-coupled plasma

The dynamic structure of two-frequency capacitively-coupled plasmas (2f-CCP) were examined using the self-consistent Particle-in-Cell/Monte Carlo (PIC/MC) simulation. At first the dependence of the discharge structure on wafer biasing conditions were investigated using one-dimensional (1D) computation. The results show that the plasma potential oscillates with both frequencies. The amplitude of the high frequency oscillation is modulated by the instantaneous potential of the low frequency biasing electrode. Furthermore, the axisymmetrical two-dimensional (2D) PIC/MC simulation was performed to investigate the influence of a geometric configuration of the reactor on the plasma structure