Published March 1, 2012
| Version v1
Journal article
Quantification of low levels of fluorine content in thin films
Creators
- 1. Centro Nacional de Aceleradores (CSIC – Univ. Sevilla), Av. Thomas A. Edison 7, E-41092 Sevilla (Spain)
- 2. Instituto de Ciencia de Materiales (CSIC – Univ. Sevilla), Américo Vespucio 49, E-41092 Sevilla (Spain)
- 3. Laboratoire des Matériaux et du Génie Physique-UMR 5628-INPGrenoble-Minatec 3, parvis Louis Néel, BP 257, 38016 Grenoble Cedex 1 (France)
Description
Fluorine quantification in thin film samples containing different amounts of fluorine atoms was accomplished by combining proton-Rutherford Backscattering Spectrometry (p-RBS) and proton induced gamma-ray emission (PIGE) using proton beams of 1550 and 2330 keV for p-RBS and PIGE measurements, respectively. The capabilities of the proposed quantification method are illustrated with examples of the analysis of a series of samples of fluorine-doped tin oxides, fluorinated silica, and fluorinated diamond-like carbon films. It is shown that this procedure allows the quantification of F contents as low as 1 at.% in thin films with thicknesses in the 100–400 nm range.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.nimb.2011.11.042Additional details
Identifiers
- DOI
- 10.1016/j.nimb.2011.11.042;
- PII
- S0168-583X(11)01073-1;
Publishing Information
- Journal Title
- Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
- Journal Volume
- 274
- Journal Page Range
- p. 65-69
- ISSN
- 0168-583X
- CODEN
- NIMBEU
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44034183
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Descriptors DEI
- DIAMONDS; DOPED MATERIALS; FLUORINATION; FLUORINE; NUCLEAR REACTION ANALYSIS; PROMPT GAMMA RADIATION; PROTON BEAMS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICA; THIN FILMS; TIN OXIDES
- Descriptors DEC
- BEAMS; CARBON; CHALCOGENIDES; CHEMICAL ANALYSIS; CHEMICAL REACTIONS; ELECTROMAGNETIC RADIATION; ELEMENTS; FILMS; GAMMA RADIATION; HALOGENATION; HALOGENS; IONIZING RADIATIONS; MATERIALS; MINERALS; NONDESTRUCTIVE ANALYSIS; NONMETALS; NUCLEON BEAMS; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; PARTICLE BEAMS; RADIATIONS; SPECTROSCOPY; TIN COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2011 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.