Published March 1, 2012 | Version v1
Journal article

Quantification of low levels of fluorine content in thin films

  • 1. Centro Nacional de Aceleradores (CSIC – Univ. Sevilla), Av. Thomas A. Edison 7, E-41092 Sevilla (Spain)
  • 2. Instituto de Ciencia de Materiales (CSIC – Univ. Sevilla), Américo Vespucio 49, E-41092 Sevilla (Spain)
  • 3. Laboratoire des Matériaux et du Génie Physique-UMR 5628-INPGrenoble-Minatec 3, parvis Louis Néel, BP 257, 38016 Grenoble Cedex 1 (France)

Description

Fluorine quantification in thin film samples containing different amounts of fluorine atoms was accomplished by combining proton-Rutherford Backscattering Spectrometry (p-RBS) and proton induced gamma-ray emission (PIGE) using proton beams of 1550 and 2330 keV for p-RBS and PIGE measurements, respectively. The capabilities of the proposed quantification method are illustrated with examples of the analysis of a series of samples of fluorine-doped tin oxides, fluorinated silica, and fluorinated diamond-like carbon films. It is shown that this procedure allows the quantification of F contents as low as 1 at.% in thin films with thicknesses in the 100–400 nm range.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.nimb.2011.11.042

Additional details

Identifiers

DOI
10.1016/j.nimb.2011.11.042;
PII
S0168-583X(11)01073-1;

Publishing Information

Journal Title
Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
Journal Volume
274
Journal Page Range
p. 65-69
ISSN
0168-583X
CODEN
NIMBEU

Optional Information

Copyright
Copyright (c) 2011 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.