Published May 15, 2004 | Version v1
Journal article

X-ray diffraction study and Monte Carlo simulation of the relaxation behavior of epitaxially grown wire structures

  • 1. Mineralogisches Institut der Universitaet Wuerzburg, Am Hubland, 97074 Wuerzburg (Germany)
  • 2. Physikalisches Institut der Universitaet Wuerzburg, Am Hubland, 97074 Wuerzburg (Germany)

Description

In this contribution a model for the elastic relaxation of Al0.5Ga0.5As and ZnSe wire structures, respectively, is presented. The wire structures extend along [11-bar0] and were characterized by high resolution x-ray diffraction experiments. Based on Monte Carlo simulations, the wire structures, which have been simulated at atomic resolution, were relaxed to reduce the strain caused by the lattice misfit. The x-ray diffraction patterns calculated for the final structures reproduce the observed data. The structures display a two dimensional strain gradient and curved lattice planes. Hence the introduced modeling is a powerful method in particular to resolve the atomic structure of a wet chemically etched or molecular beam epitaxial grown wire by giving a microscopic picture on an atomic scale

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
95
Journal Issue
10
Journal Page Range
p. 5494-5497
ISSN
0021-8979
CODEN
JAPIAU

Optional Information

Notes
(c) 2004 American Institute of Physics.