Formation and retention of low Σ interfaces in PTC thermistors
Creators
- 1. Manchester Materials Science Centre, University of Manchester, UMIST Grosvenor Street, Manchester M1 7HS (United Kingdom)
Description
The distribution of grain boundary types in a barium titanate based positive temperature coefficient of resistance (PTC) thermistor was established using electron backscatter pattern analysis in a scanning electron microscope. A higher proportion of Σ = 3 interfaces than would be expected from a random grain distribution was observed, together with numerous Σ = 5 and Σ = 9 grain boundaries. All of these grain boundary types are reported in the literature to be PTC inactive, and hence should not contribute to the overall PTC response of the device. The Σ = 3 interfaces were further characterised on the basis of their microstructure as grain boundaries or annealing twins, from which it was established that the proportion of Σ = 3 grain boundaries in the thermistor increased only slightly during the sintering process, whereas the proportion of annealing twins increased significantly during the first 30 min of soak at the peak sintering temperature. Σ = 3 grain boundaries were found to be immobile during grain growth, in contrast with high angle grain boundaries, which showed considerable migration
Additional details
Identifiers
- DOI
- 10.1016/j.actamat.2005.02.036;
- PII
- S1359-6454(05)00136-9;
Publishing Information
- Journal Title
- Acta Materialia
- Journal Volume
- 53
- Journal Issue
- 9
- Journal Page Range
- p. 2751-2758
- ISSN
- 1359-6454
- CODEN
- ACMAFD
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 37055990
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ANNEALING; BACKSCATTERING; BARIUM; DISTRIBUTION; GRAIN BOUNDARIES; GRAIN GROWTH; INTERFACES; MIGRATION; RETENTION; SCANNING ELECTRON MICROSCOPY; SINTERING; TEMPERATURE COEFFICIENT; THERMISTORS; TITANATES
- Descriptors DEC
- ALKALINE EARTH METALS; ELECTRON MICROSCOPY; ELEMENTS; FABRICATION; HEAT TREATMENTS; METALS; MICROSCOPY; MICROSTRUCTURE; OXYGEN COMPOUNDS; REACTIVITY COEFFICIENTS; SCATTERING; SEMICONDUCTOR DEVICES; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.