Published January 1, 2005 | Version v1
Journal article

Thermally induced diffusion in GaInNAs/GaAs and GaInAs/GaAs quantum wells grown by solid source molecular beam epitaxy

  • 1. School of Electrical and Electronic Engineering, Nanyang Technological University, Block S1, 50 Nanyang Avenue (Singapore)
  • 2. School of Electrical and Electronic Engineering, Nanyang Technological University, Block S1, 50 Nanyang Avenue, Singapore and Singapore-Massachusetts Institute of Technology (MIT) Alliance, Nanyang Technological University (Singapore)

Description

The effects of the thermal annealing induced diffusion on the photoluminescence (PL) of a GaAs/GaInAs/GaAs/GaInNAs/GaAs quantum well (QW) structure grown by solid source molecular beam epitaxy are studied. The PL experimental results in conjunction with the numerical quantum-mechanical modeling that predicts the changes in the QW confining potential with group-III atomic diffusion, have been used to obtain the values for diffusion coefficient. The activation energies of GaInAs/GaAs QW (ED,GIA) were found to be between 0.49 to 0.51 eV, while that of GaInNAs/GaAs QW (ED,GINA) showed comparable values of between 0.6 to a 0.67 eV, as annealing time increases from 10 to 30 s. The ED,GIA and ED,GINA values are attributed to the same interstitial diffusion mechanism

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
97
Journal Issue
1
Journal Page Range
p. 013506-013506.8
ISSN
0021-8979
CODEN
JAPIAU

Optional Information

Notes
(c) 2005 American Institute of Physics