Published 2006 | Version v1
Miscellaneous Open

Effect of the deposition temperature on the roughness of polycrystalline silicon thin films obtained by LPCVD

  • 1. Faculdade de Tecnologia de Sao Paulo (FATEC-SP CEETEPS), SP (Brazil). Centro Estadual Educacao Tecnologica Paula Souza

Description

no abstract available

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Additional details

Additional titles

Original title (Portuguese)
Efeito da temperatura de deposicao na rugosidade de filmes finos de silicio policristalino obtidos por LPCVD

Publishing Information

Imprint Pagination
[1 p.]
Report number
INIS-BR--8488

Conference

Title
29. Brazilian national meeting on condensed matter physics
Original Conference Title
29. Encontro nacional de fisica da materia condensada
Dates
9-13 May 2006
Place
Sao Lourenco, MG (Brazil)