Published April 1988 | Version v1
Report Restricted

Vibrational spectra of silica near 2400/degree/K: Measurement and molecular dynamics simulation

Description

The nature and distribution of localized and extended structural units in vitreous materials, which can be modified through annealing, depends upon the thermal history of the melt and the time interval over which the melt is quenched to form the glassy state. Raman spectroscopy has been used to probe chemical bonding in amorphous silica as a function of temperature, pressure, and mechanical and chemical stress, and following exposure to ionizing radiation. Results are useful in developing structural models of glass based upon molecular dynamics simulation of the vibrational spectrum of the melt. Raman spectra of vitreous silica and of melts at temperatures approaching 2400/degree/K are reported in this work using a synchronous measurement technique which effectively minimizes the amount of blackbody radiation reaching the detector. Experimental results are compared with simulated spectra of the melt using molecular dynamics calculations based on a simple pairwise potential. A structural picture of vitreous and molten silica has been proposed based upon these comparisons. 4 refs., 1 fig

Availability note (English)

MF available from INIS under the Report Number; Available from NTIS, PC A02/MF A01; 1 as DE88015925.

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Additional details

Publishing Information

Imprint Pagination
3 p.
Report number
PNL-SA--15788

Conference

Title
11. international conference on raman spectroscopy.
Dates
5-9 Sep 1988.
Place
London (UK).

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
20011383
Subject category
S36: MATERIALS SCIENCE; S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
AMORPHOUS STATE; CHEMICAL BONDS; LASER-RADIATION HEATING; PULSE TECHNIQUES; RAMAN SPECTRA; RAMAN SPECTROSCOPY; SILICON OXIDES; SIMULATION; STRUCTURAL MODELS
Descriptors DEC
CHALCOGENIDES; HEATING; LASER SPECTROSCOPY; OXIDES; OXYGEN COMPOUNDS; PLASMA HEATING; SILICON COMPOUNDS; SPECTRA; SPECTROSCOPY

Optional Information

Notes
Portions of this document are illegible in microfiche products.
Secondary number(s)
CONF-880950--2.