Published December 2021 | Version v1
Journal article

Influence of Ar-impurities on the wettability of IBS-deposited Y2O3 thin films

  • 1. RhySearch, The Rhine Valley Research and Innovation Centre, Werdenbergstr 4, CH-9471 Buchs (Switzerland)
  • 2. Ion Beam Physics, ETH Zurich, CH-8093 Zurich (Switzerland)

Description

Highlights: • The hydrophobicity of IBS Y2O3 films was tested for different sputter parameters. • The residual Ar-content of the film plays a decisive role for the hydrophobicity. • Higher O to Y ratio improves the hydrophobicity. • Y2O3 terminated Y2O3:SiO2 nanolaminates are hydrophobic. The wettability and the control of the contact angle of surfaces are important for various applications. Materials with a water contact angle less than or greater than 90 deg are hydrophilic or hydrophobic, respectively. Most of the binary oxides are hydrophilic, but oxides of rare earth metals and metal atoms with low electronegativity have hydrophobic surfaces. Yttria is one of the materials predicted to have hydrophobic properties. In this work, we investigated the wettability of ion-beam-sputtered Yttria thin films. The measured water contact angles were between 67° and 96°. The concentration of the embedded argon atoms was found to influence the contact angle.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2021.150880

Additional details

Identifiers

DOI
10.1016/j.apsusc.2021.150880;
PII
S0169433221019395;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
568
Journal Page Range
vp.
ISSN
0169-4332
CODEN
ASUSEE

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
54078580
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
COATINGS; RARE EARTHS; SILICON OXIDES; THIN FILMS; WETTABILITY; YTTRIUM OXIDES
Descriptors DEC
CHALCOGENIDES; ELEMENTS; FILMS; METALS; OXIDES; OXYGEN COMPOUNDS; SILICON COMPOUNDS; TRANSITION ELEMENT COMPOUNDS; YTTRIUM COMPOUNDS

Optional Information

Copyright
Copyright (c) 2021 Elsevier B.V. All rights reserved.