Light emission and atomic coordination structure of sol-gel derived erbium-doped SiO2-TiO2 thin films
Creators
- 1. Department of Materials Science, National University of Tainan, Tainan 700, Taiwan (China)
- 2. Department of Materials Science and Engineering, National Cheng Kung University, Tainan 701, Taiwan (China)
Description
Erbium-doped SiO2-TiO2 thin films were prepared by the sol-gel method, using erbium nitrate pentahydrate powder, tetraethyl-orthosilicate (TEOS), and titanium tetraisopropoxide (TTIP) as precursors. The Si/Ti ratios in the SiO2-TiO2 films agree with the TEOS/TTIP molar ratio in the sol-gel precursor. Atomic coordination structure of erbium was defined by extended X-ray absorption fine structure spectrometry (EXAFS) and optical properties of the films were characterized by micro-photoluminescence (Micro-PL). The first-neighbor-shell coordination number of erbium in SiO2-TiO2 thin films would influence the optical properties. The 700 °C-annealed 80%SiO2-20%TiO2:Er1.0% (mol%) film with the lowest coordination number exhibits the highest photoluminescence intensity. Moreover, Fourier transform infrared spectroscopy (FTIR) analysis reveals that the main bonding structures of SiO2-TiO2 thin films are related to the erbium dopants. The modification of microstructure and chemical bonding configuration in the SiO2-TiO2 films by the Er-doping concentration and its influence on the optical properties are discussed. - Highlights: • Er-doped SiO2-TiO2 films were prepared using a sol-gel technique. • The Er dopants in SiO2-TiO2 films can prevent TiO2 precipitation from the matrix. • More Si−O−Ti bonds in SiO2-TiO2 thin films enhance a higher luminescence intensity. • The 1.0% Er doped oxide film possesses the lowest oxygen coordination number. • The 1.0% Er doped oxide film can account for the high luminescence intensity.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2017.08.045Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2017.08.045;
- PII
- S0040-6090(17)30644-2;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 640
- Journal Page Range
- p. 20-26
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 49080751
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ABSORPTION SPECTROSCOPY; BONDING; CHEMICAL BONDS; COORDINATION NUMBER; DOPED MATERIALS; FINE STRUCTURE; FOURIER TRANSFORM SPECTROMETERS; INFRARED SPECTRA; OPTICAL PROPERTIES; OXIDATION; SOL-GEL PROCESS; THIN FILMS; TITANIUM OXIDES; VISIBLE RADIATION; X-RAY SPECTROSCOPY
- Descriptors DEC
- CHALCOGENIDES; CHEMICAL REACTIONS; ELECTROMAGNETIC RADIATION; FABRICATION; FILMS; JOINING; MATERIALS; MEASURING INSTRUMENTS; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; RADIATIONS; SPECTRA; SPECTROMETERS; SPECTROSCOPY; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2017 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.