Published March 1, 2010 | Version v1
Journal article

Grain growth and crack formation in NiO thin films by swift heavy ion irradiation

  • 1. Department of Physics, Utkal University, Bhubaneswar 751 004 (India)
  • 2. Department of Physics, North Orissa University, Baripada 757 003 (India)
  • 3. School of Material Science and Technology, Institute of Technology, BHU, Varanasi 221 005 (India)
  • 4. Inter-University Accelerator Center, Aruna Asaf Ali Marg, Post Box No: 10502, New Delhi 110 067 (India)
  • 5. Institute of Physics, Bhubaneswar 751 005 (India)

Description

NiO thin films grown on Si(1 0 0) substrates by electron beam evaporation and sintered at 700 deg. C, were irradiated by 120 MeV Au9+ ions. Though irradiation is known to induce lattice disorder and suppression of crystallinity, we observe grain growth at some fluences of irradiation. Associated with the growth of grains, the films develop cracks at a fluence of 3 x 1012 ions cm-2. The width of the cracks increased at higher fluences. Swift heavy ion irradiation induced atomic diffusion and strain relaxation in nanoparticle thin films, which are not in thermodynamic equilibrium, seem to be responsible for the observed grain growth. This phenomenon along with the tensile stress induced surface instability lead to crack formation in the NiO thin films.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.nimb.2009.11.004

Additional details

Identifiers

DOI
10.1016/j.nimb.2009.11.004;
PII
S0168-583X(09)01282-8;

Publishing Information

Journal Title
Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
Journal Volume
268
Journal Issue
5
Journal Page Range
p. 470-475
ISSN
0168-583X
CODEN
NIMBEU

Optional Information

Copyright
Copyright (c) 2009 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.