Published 1991
| Version v1
Miscellaneous
Influence of deposition parameters of Fe thin films of Si <100> and Si <111> in Fe-Si reaction
- 1. Rio Grande do Sul Univ., Porto Alegre, RS (Brazil)
Description
Published in summary form only
Additional details
Additional titles
- Original title (Portuguese)
- Influencia dos parametros de deposicao de filmes finos de Fe sobre Si <100> e Si <111> na reacao Fe-Si
Publishing Information
- Imprint Title
- Proceedings of the 14. National Meeting on Condensed Matter Physics. v.2
- Imprint Pagination
- 201 p.
- Journal Page Range
- p. 313.
- Report number
- INIS-BR--2933
Conference
- Title
- 14. National Meeting on Condensed Matter Physics.
- Dates
- 7-11 May 1991.
- Place
- Caxambu, MG (Brazil).
INIS
- Country of Publication
- Brazil
- Country of Input or Organization
- Brazil
- INIS RN
- 23081829
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference, No Abstract
- Descriptors DEI
- ANNEALING; DEPOSITION; ELECTRIC CONDUCTIVITY; ELECTRON GUNS; IRON; MOESSBAUER EFFECT; OXIDATION; RUTHERFORD SCATTERING; SILICON; THIN FILMS; X-RAY DIFFRACTION
- Descriptors DEC
- CHEMICAL REACTIONS; COHERENT SCATTERING; DIFFRACTION; ELASTIC SCATTERING; ELECTRICAL PROPERTIES; ELEMENTS; FILMS; HEAT TREATMENTS; METALS; PHYSICAL PROPERTIES; SCATTERING; SEMIMETALS; TRANSITION ELEMENTS
Optional Information
- Notes
- Imprint:Anais do 14. Encontro Nacional de Fisica da Materia Condensada. v. 2.