Published June 1991 | Version v1
Report

Generation and focusing of proton beam by the Inverse Pinch Ion Diode

  • 1. Himeji Inst. of Tech., Hyogo (Japan)

Description

We performed generation and focusing of ion beams by the 'Inverse Pinch Ion Diode' which has a flat anode. The ion beams were extracted from a radial position of 10 ∼ 15 mm on the anode and the ion beams were focused on the diode axis at 120 mm from the anode. At this point, an ion current density of 0.4 kA/cm2 and a power density of 0.1 GW/cm2 were obtained. A focal angle was estimated to be 7deg. (author)

Part of:
Symposium on development and applications of intense pulsed particle beams

Additional details

Publishing Information

Imprint Title
Symposium on development and applications of intense pulsed particle beams
Imprint Pagination
151 p.
Journal Page Range
p. 45-53.
Report number
NIFS-PROC--8

Conference

Title
Symposium on development and applications of intense pulsed particle beams.
Dates
6-7 Dec 1990.
Place
Nagoya (Japan).

INIS

Country of Publication
Japan
Country of Input or Organization
Japan
INIS RN
23029222
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
BEAM PRODUCTION; FOCUSING; HIGH-VOLTAGE PULSE GENERATORS; INERTIAL CONFINEMENT; ION BEAMS; ION SOURCES; PINCH EFFECT; PROTON BEAMS
Descriptors DEC
BEAMS; CONFINEMENT; ELECTRONIC EQUIPMENT; EQUIPMENT; FUNCTION GENERATORS; NUCLEON BEAMS; PARTICLE BEAMS; PLASMA CONFINEMENT; PULSE GENERATORS

Optional Information