Published October 1, 1993 | Version v1
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The threshold energy for defect production in SiC: A molecular dynamic study

  • 1. Lawrence Livermore National Lab., CA (United States)
  • 2. Universidad Politecnica de Madrid (Spain). Instituto de Fusion Nuclear

Description

We discuss the results of molecular dynamics computer simulation studies of the threshold energy for defect production in β-SiC. The simulations are performed with the Tersoff potential for SiC which provides accurate values of many of its defect properties. In addition, we show that it properly describes the melting behavior of SiC. Simulations were carried out for Si and C recoils in 3 dimensional cubic computational cells with periodic boundary conditions and up to 4096 atoms. The results show anisotropy in the threshold for Si and C recoils as well as for the recoil direction. The lowest threshold is 25 eV for C recoils along [111] and the highest is 85 eV for Si recoils along [110]. Details of the defect configurations obtained will be discussed

Availability note (English)

MF available from INIS under the Report Number; Also available from OSTI as DE94007123; NTIS; US Govt. Printing Office Dep.

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Additional details

Publishing Information

Imprint Pagination
13 p.
Report number
UCRL-JC--114789

Conference

Title
6. international conference on fusion reactor materials.
Dates
27 Sep - 1 Oct 1993.
Place
Stresa (Italy).

Optional Information

Contract/Grant/Project number
Contract W-7405-ENG-48
Funding organization
USDOE, Washington, DC (United States).
Secondary number(s)
CONF-930928--28.