Published 2010 | Version v1
Miscellaneous Metadata-only

Characterization of silanization processes on surface of SiO2 by MEV, XPS and AFM for construction of biosensors

Creators

  • 1. Universidade de Sao Paulo (USP), Sao Carlos, SP (Brazil)
  • 2. Universidade Federal de Sao Carlos (UFSCAR), SP (Brazil)
  • 3. Laboratorio Nacional de Luz Sincrotron (LNLS), Campinas, SP (Brazil)
  • 4. Universidade Federal de Goias (UFGO), Goiania, GO (Brazil)

Description

no abstract available

Part of:
Proceedings of the 20. RAU: Annual meeting of the LNLS users. Abstracts of scientific papers

Additional details

Additional titles

Original title (Portuguese)
Caracterizacao de processos de silanizacao em superficie de SiO

Publishing Information

Imprint Title
Proceedings of the 20. RAU: Annual meeting of the LNLS users. Abstracts of scientific papers
Imprint Pagination
273 p.
Journal Page Range
p. 214

Conference

Title
Annual meeting of the LNLS users
Original Conference Title
20. RAU: Reuniao anual de usuarios do LNLS
Acronym
20. RAU
Dates
22-23 Feb 2010
Place
Campinas, SP (Brazil)

INIS

Country of Publication
Brazil
Country of Input or Organization
Brazil
INIS RN
41078916
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
No Abstract, Conference, Non-conventional Literature
Descriptors DEI
ATOMIC FORCE MICROSCOPY; ELECTRON SPECTRA; SCANNING ELECTRON MICROSCOPY; SCANNING TUNNELING MICROSCOPY; SILICON; SILICON OXIDES; X RADIATION; X-RAY PHOTOELECTRON SPECTROSCOPY
Descriptors DEC
CHALCOGENIDES; ELECTROMAGNETIC RADIATION; ELECTRON MICROSCOPY; ELECTRON SPECTROSCOPY; ELEMENTS; IONIZING RADIATIONS; MICROSCOPY; OXIDES; OXYGEN COMPOUNDS; PHOTOELECTRON SPECTROSCOPY; RADIATIONS; SEMIMETALS; SILICON COMPOUNDS; SPECTRA; SPECTROSCOPY

Optional Information

Notes
Imprint:Anais da 20. RAU: Reuniao anual de usuarios do LNLS. Resumos de trabalhos cientificos