Published April 2014 | Version v1
Journal article

Characterisation of 3D-GaN/InGaN core-shell nanostructures by transmission electron microscopy

  • 1. School of Physics, H. H. Wills Physics Laboratory, University of Bristol, Tyndall Avenue, Bristol, BS8 1TL (United Kingdom)
  • 2. Institute of Semiconductor Technology, Braunschweig University of Technology, Hans-Sommer-Strasse 66, 38106 Braunschweig (Germany)
  • 3. Osram Opto Semiconductors GmbH, Leibnizstrasse 4, 93055 Regensburg (Germany)

Description

Transmission and scanning electron microscopy have been used to characterise GaN/InGaN 3D nanostructures grown on patterned GaN/sapphire substrates by metal organic vapour phase epitaxy (MOVPE). It has been found that the growth of well ordered arrays of such nanostructures, containing multiple quantum wells on non-polar side-facets, can be achieved with a low density of defects. Growth changes and surface morphology play a major role in the nucleation of any defects present. The nanostructure morphology has been investigated and differing growth rates on adjacent facets studied. (copyright 2014 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

Availability note (English)

Available from: http://dx.doi.org/10.1002/pssc.201300522

Additional details

Identifiers

Publishing Information

Journal Title
Physica Status Solidi. C, Current Topics in Solid State Physics (Online)
Journal Volume
11
Journal Issue
3-4
Journal Page Range
p. 425-427
ISSN
1610-1642

Conference

Title
10. International conference on nitride semiconductors (ICNS-10)
Dates
25-30 Aug 2013
Place
Washington, DC (United States)

Optional Information

Notes
With 5 figs., 5 refs.