Published October 1995 | Version v1
Journal article Metadata-only

The ILU-8TP system for thick-film paste curing by means of electron beam

Creators

  • 1. Budker Inst. of Nuclear Physics, Novosibirsk (Russian Federation)

Description

ILU-8TP system was designed for electron beam curing of thick-film pastes in the frame of screen-and-fire technological process of production of hybrid integrated circuits (HIC). It comprises electron accelerator ILU-8 (electron beam energy 1 MeV, power 20 kW) X-ray shielding, three internal conveyors and associate support devices. The system cleans plates, dries and hardens thick-film coating, trims resistors. Electron beam treatment process lasts 40-60 seconds with maximum temperature of 1000 centigrades. Maximum productivity of ILU-8TP is 3000 plates per hour. Usage of ILU-8TP instead of baking oven gives improved quality of thick-film components. (author)

Additional details

Publishing Information

Journal Title
Radiation Physics and Chemistry (1993)
Journal Volume
46
Journal Issue
4-6
Journal Page Range
p. 461-463.
ISSN
0969-806X
CODEN
RPCHDM

Conference

Title
9. international meeting on radiation processing.
Dates
11-16 Sep 1994.
Place
Istanbul (Turkey).

INIS

Country of Publication
United Kingdom
Country of Input or Organization
United Kingdom
INIS RN
27065806
Subject category
S07: ISOTOPES AND RADIATION SOURCES;
Resource subtype / Literary indicator
Conference
Descriptors DEI
COATINGS; ELECTRON BEAMS; INTEGRATED CIRCUITS; MEV RANGE 01-10; PRODUCTIVITY; RADIATION CURING; SPECIFICATIONS; TEMPERATURE RANGE 0400-1000 K
Descriptors DEC
BEAMS; CHEMICAL RADIATION EFFECTS; CURING; ELECTRONIC CIRCUITS; ENERGY RANGE; LEPTON BEAMS; MEV RANGE; PARTICLE BEAMS; RADIATION EFFECTS; TEMPERATURE RANGE

Optional Information

Notes
Published in two parts.