Microhardness characterization of multilayers modified by ion beam mixing

Until now, thin films' deposition is the principal way to perform materials' surface finishing. Multilayers normally improve some of the original properties of a thin film. High corrosion resistance and high hardness values can be obtained with a particular multilayer wavelength. The high hardness presented by some multilayers may be attributed to the thin films' interfaces. The periodic interface structure can originate a great intrinsic stress, increasing the coating hardness. Nevertheless, adhesion problems may occur. The present work verifies the hardness of the multilayers and its relation with the use of ion beam mixing (IBM) to improve the adhesion of the coating with the substrate. The multilayers are deposited by magnetron sputtering and are composed of chromium and vanadium. The multilayers were characterized by several techniques like Rutherford backscattering (RBS) and microhardness. The multilayer coating present no contamination and high hardness values, even after the use of the IBM technique