Published October 26, 2009 | Version v1
Journal article

Mg doping and its effect on the semipolar GaN(1122) growth kinetics

  • 1. Equipe mixte CEA-CNRS 'Nanophysique et Semiconducteurs', CEA-Grenoble, INAC/SP2M/NPSC, 17 rue des Martyrs, 38054 Grenoble (France)
  • 2. Institut NEEL, CNRS and Universite Joseph Fourier, BP166, 38042 Grenoble Cedex 9 (France)
  • 3. CIMAP, UMR6252, CNRS-ENSICAEN-CEA-UCBN, 6 Boulevard du Marechal Juin, 14050 Caen (France)
  • 4. I. Physikalisches Institut, Justus-Liebig-Universitaet Giessen, 35392 Giessen (Germany)

Description

We report the effect of Mg doping on the growth kinetics of semipolar GaN(1122) synthesized by plasma-assisted molecular-beam epitaxy. Mg tends to segregate on the surface, inhibiting the formation of the self-regulated Ga film which is used as a surfactant for the growth of undoped and Si-doped GaN(1122). We observe an enhancement of Mg incorporation in GaN(1122) compared to GaN(0001). Typical structural defects or polarity inversion domains found in Mg-doped GaN(0001) were not observed for the semipolar films investigated in the present study.

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
95
Journal Issue
17
Journal Page Range
p. 171908-171908.3
ISSN
0003-6951
CODEN
APPLAB

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
41040437
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
CRYSTAL GROWTH; DOPED MATERIALS; GALLIUM NITRIDES; MAGNESIUM; MOLECULAR BEAM EPITAXY; SEGREGATION; SEMICONDUCTOR MATERIALS; SURFACTANTS; THIN FILMS
Descriptors DEC
ALKALINE EARTH METALS; CRYSTAL GROWTH METHODS; ELEMENTS; EPITAXY; FILMS; GALLIUM COMPOUNDS; MATERIALS; METALS; NITRIDES; NITROGEN COMPOUNDS; PNICTIDES

Optional Information

Notes
(c) 2009 American Institute of Physics