Self-neutralized ion beam
Creators
- 1. Institute of Physics, University of Sao Paulo, C.P. 66318, CEP 05315-970 Sao Paulo S.P. (Brazil)
- 2. High Current Electronics Institute, Russian Academy of Sciences, Tomsk 634055 (Russian Federation)
- 3. Gesellschaft fuer Schwerionenforschung, D-64291 Darmstadt (Germany)
- 4. Lawrence Berkeley National Laboratory, Berkeley, California 94720 (United States)
Description
A vacuum arc ion source provides high current beams of metal ions that have been used both for accelerator injection and for ion implantation, and in both of these applications the degree of space charge neutralization of the beam is important. In accelerator injection application, the beam from the ion source may be accelerated further (post-acceleration), redirected by a bending magnet(s), or focused with magnetic or electrostatic lenses, and knowledge of the beam space charge is needed for optimal design of the optical elements. In ion implantation application, any build-up of positive charge in the insulating targets must be compensated by a simultaneous flux of cold electrons so as to provide overall charge neutrality of the target. We show that in line-of-sight ion implantation using a vacuum arc ion source, the high current ion beam carries along its own background sea of cold electrons, and this copious source of electrons provides a ''self-neutralizing'' feature to the beam. Here we describe experiments carried out in order to demonstrate this effect, and we provide an analysis showing that the beam is space-charge-neutralized to a very high degree
Additional details
Identifiers
- DOI
- 10.1063/1.3638714;
Publishing Information
- Journal Title
- Journal of Applied Physics
- Journal Volume
- 110
- Journal Issue
- 8
- Journal Page Range
- p. 083308-083308.6
- ISSN
- 0021-8979
- CODEN
- JAPIAU
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 43126487
- Subject category
- S43: PARTICLE ACCELERATORS; S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- ACCELERATION; ACCELERATORS; BEAM BENDING MAGNETS; BEAM CURRENTS; BEAM FOCUSING MAGNETS; BEAM OPTICS; ELECTRONS; ELECTROSTATIC LENSES; INDIUM IONS; ION BEAMS; ION IMPLANTATION; ION SOURCES; PLASMA; SPACE CHARGE
- Descriptors DEC
- BEAMS; CHARGED PARTICLES; CURRENTS; ELEMENTARY PARTICLES; EQUIPMENT; FERMIONS; IONS; LENSES; LEPTONS; MAGNETS
Optional Information
- Notes
- (c) 2011 American Institute of Physics