Published 2009 | Version v1
Miscellaneous Open

Characterisation of titanium nitride films obtained by metalorganic chemical vapor deposition (MOCVD)

  • 1. Instituto de Pesquisas Energeticas e Nucleares (CCTM/IPEN/CNEN-SP), Sao Paulo, SP (Brazil). Centro de Ciencia e Tecnologia de Materiais
  • 2. Universidade de Sao Paulo (IF/USP), SP (Brazil). Inst. de Fisica
  • 3. Instituto de Pesquisas Energeticas e Nucleares (IPEN/CNEN-SP), Sao Paulo, SP (Brazil)
  • 4. Fundacao de Amparo a Ciencia e Tecnologia de Pernambuco (FACEPE), Recife, PE (Brazil)
  • 5. Universidade Federal de Pernambuco (IF/UFPE), Recife, PE (Brazil). Inst. de Fisica

Description

Ceramic coatings have been widely used as protective coating to improve the life of cutting tools, for corrosion protection and in microelectronics, optical and medical areas. Transition metals nitrides are of special interest due to its high hardness and thermal stability. In this work thin films of titanium nitride were obtained by MOCVD (metalorganic chemical vapor deposition) process. The tests were carried out for 1h at 700 deg C under 80 and 100 mbar of pressure. The characterization was made by using scanning electron microscopy coupled with dispersive energy analysis, and X-ray diffraction. Preliminary results suggested that Ti2N phase was formed and that the growth rate varied between 4 and 13 nm/min according to the process parameter considered. (author)

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Additional details

Additional titles

Original title (Portuguese)
Caracterizacao de filmes de nitreto de titanio obtidos por MOCVD

Publishing Information

Imprint Pagination
9 p.
Report number
INIS-BR--10297

Conference

Title
53. Brazilian congress on ceramics
Original Conference Title
53. Congresso brasileiro de ceramica
Dates
7-10 Jun 2009
Place
Guaruja, SP (Brazil)