Published 1992 | Version v1
Book

Alloy versus phonon contributions to intervalley scattering in Al1-xGaxAs

  • 1. IBM Research Division, Yorktown Heights, NY (United States). T.J. Watson Research Center
  • 2. Harvard Univ., Cambridge, MA (United States). Division of Applied Sciences
  • 3. Max-Planck-Inst. fuer Festkoerperforschung, Stuttgart (Germany)

Description

The authors have previously calculated intervalley scattering (IVS) times for GaAs, resulting in good agreement with various experiments, although some details are still under discussion. In this paper, they consider a semiconductor alloy like Al1-xGaxAs, where scattering due to disorder competes with phonon-assisted intervalley scattering. They have calculated the scattering times from the Γ point in indirect Al1-xGaxAs (x > 0.4) to the satellite valleys at L and X using a second-order perturbational approach. Other methods have also been investigated. They find that disorder-induced scattering is about twice as effective as phonon-assisted scattering, even at room temperature. They also calculate the lifetime broadenings caused by these processes and compare them to experimental broadenings of the Ε0 gap obtained by resonant Raman scattering and spectroscopic ellipsometry. IVS times in InP from the Γ valley to side valleys around L and X are given as a function of energy at 0 and 300 K as well as the return times from the L and X points to the Γ valley from 0 to 400 K. The results suggest that the strength of the electron-phonon interaction in InP is similar to that in GaAs. Therefore, the IVS times in InP can also be obtained from those of GaAs by a simple extrapolation allowing for the different position of the satellite valleys. Conclusions about IVS times in Al1-x GaxAs, however, cannot be drawn from data on GaAs, because most IVS in Al1-xGax As is due to alloy scattering, which does not occur in GaAs

Part of:
Ultrafast lasers probe phenomena in semiconductors and superconductors

Additional details

Publishing Information

Publisher
SPIE--The International Society for Optical Engineering.
Imprint Place
Bellingham, WA (United States)
ISBN
0-8194-0838-7
Imprint Title
Ultrafast lasers probe phenomena in semiconductors and superconductors
Imprint Pagination
282 p.
Journal Page Range
p. 75-84.

Conference

Title
physics toward device applications.
Acronym
Symposium on advances in semiconductors and superconductors
Dates
23-27 Mar 1992.
Place
Somerset, NJ (United States).

Optional Information

Secondary number(s)
CONF-920309--.