Published October 1, 1994
| Version v1
Journal article
Sensitivity of BP-1 glass detectors etched in methanesulfonic acid
Creators
- 1. Department of Physics, University of California at Berkeley, Berkeley, CA 94720 (United States)
Description
We recently discovered that methanesulfonic acid is a suitable etchant for BP-1 barium phosphate glass detectors. This paper reports on the sensitivity and charge resolution of BP-1 detectors etched in methanesulfonic acid in comparison with those etched in commonly used etchants such as hydrofluoric acid and fluoboric acid using 11 A GeV 197Au ions at the Brookhaven Alternating Gradient Synchrotron. This new etchant, as a replacement for hydrofluoric acid, is environmentally easy to handle and would have applications to relativistic heavy-ion studies. We also tested ethanesulfonic acid and found it has no practical use due to its extremely slow general etch rate. ((orig.))
Additional details
Publishing Information
- Journal Title
- Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
- Journal Volume
- 94
- Journal Issue
- 1-2
- Journal Page Range
- p. 113-118.
- ISSN
- 0168-583X
- CODEN
- NIMBEU
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- Netherlands
- INIS RN
- 26011812
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Descriptors DEI
- CHARGE STATES; DIELECTRIC TRACK DETECTORS; ELECTRIC CHARGES; ETCHING; GLASS; GOLD IONS; HEAVY ION REACTIONS; ION BEAMS; ION DETECTION; RELATIVISTIC RANGE; SENSITIVITY; SULFONIC ACIDS
- Descriptors DEC
- BEAMS; CHARGED PARTICLE DETECTION; CHARGED PARTICLES; DETECTION; ENERGY RANGE; IONS; MEASURING INSTRUMENTS; NUCLEAR REACTIONS; ORGANIC ACIDS; ORGANIC COMPOUNDS; ORGANIC SULFUR COMPOUNDS; RADIATION DETECTION; RADIATION DETECTORS