Thermodynamics of the formation of face-centered-cubic silicon nanocrystals in silicon-rich SiC thin films annealed using rapid thermal annealing
- 1. Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201 (China)
- 2. National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083 (China)
Description
Highlights: ► Fcc-structured Si-NCs were formed in the surface layer of SiC-matrix thin film. ► Nucleation of fcc-structured Si-NCs was demonstrated using thermodynamics. ► Gibbs free energy and surface energy determined the structure of Si-NC nuclei. ► Nano-induced pressure was helpful for the nucleation of fcc-structured Si-NCs. ► Formation of fcc-structured Si-NCs was unrelated to the effect of carbon-doping. - Abstract: Silicon nanocrystals (Si-NCs) in silicon carbide (SiC) matrix fabricated by rapid thermal annealing were characterized using grazing incidence X-ray diffraction and transmission electron microscopy. Two structures of Si-NCs were found in the thin films. Si-NCs in the surface layer had face-centered cubic (fcc) structure, whereas those in the inner layer had cubic diamond (cd) structure. The thermodynamics for the formation of fcc-structured Si-NCs was demonstrated. We suggested that two main factors, Gibbs free energy per atom and surface energy, determined what structure of Si-NC nucleus to be formed. Specifically, reducing the Gibbs free energy per atom of fcc-Si crystal and lowering the surface energy of fcc-Si crystal would be helpful for the formation of fcc-structured Si-NC nucleus. In addition, the effects of carbon and substrate on the formation of Si-NCs were discussed. The work suggested that fcc-structured Si-NCs were readily generated in the surface layer of Si-rich SiC thin films.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.apsusc.2012.10.197Additional details
Identifiers
- DOI
- 10.1016/j.apsusc.2012.10.197;
- PII
- S0169-4332(12)01953-8;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 265
- Journal Page Range
- p. 286-290
- ISSN
- 0169-4332
- CODEN
- ASUSEE
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44103100
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ANNEALING; CRYSTALS; FCC LATTICES; FREE ENTHALPY; LAYERS; NANOSTRUCTURES; NUCLEATION; SILICON; SILICON CARBIDES; SURFACE ENERGY; SURFACES; THERMODYNAMICS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X-RAY DIFFRACTION
- Descriptors DEC
- CARBIDES; CARBON COMPOUNDS; COHERENT SCATTERING; CRYSTAL LATTICES; CRYSTAL STRUCTURE; CUBIC LATTICES; DIFFRACTION; ELECTRON MICROSCOPY; ELEMENTS; ENERGY; FILMS; FREE ENERGY; HEAT TREATMENTS; MICROSCOPY; PHYSICAL PROPERTIES; SCATTERING; SEMIMETALS; SILICON COMPOUNDS; SURFACE PROPERTIES; THERMODYNAMIC PROPERTIES
Optional Information
- Copyright
- Copyright (c) 2012 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.