Published January 15, 2013 | Version v1
Journal article

Thermodynamics of the formation of face-centered-cubic silicon nanocrystals in silicon-rich SiC thin films annealed using rapid thermal annealing

  • 1. Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201 (China)
  • 2. National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083 (China)

Description

Highlights: ► Fcc-structured Si-NCs were formed in the surface layer of SiC-matrix thin film. ► Nucleation of fcc-structured Si-NCs was demonstrated using thermodynamics. ► Gibbs free energy and surface energy determined the structure of Si-NC nuclei. ► Nano-induced pressure was helpful for the nucleation of fcc-structured Si-NCs. ► Formation of fcc-structured Si-NCs was unrelated to the effect of carbon-doping. - Abstract: Silicon nanocrystals (Si-NCs) in silicon carbide (SiC) matrix fabricated by rapid thermal annealing were characterized using grazing incidence X-ray diffraction and transmission electron microscopy. Two structures of Si-NCs were found in the thin films. Si-NCs in the surface layer had face-centered cubic (fcc) structure, whereas those in the inner layer had cubic diamond (cd) structure. The thermodynamics for the formation of fcc-structured Si-NCs was demonstrated. We suggested that two main factors, Gibbs free energy per atom and surface energy, determined what structure of Si-NC nucleus to be formed. Specifically, reducing the Gibbs free energy per atom of fcc-Si crystal and lowering the surface energy of fcc-Si crystal would be helpful for the formation of fcc-structured Si-NC nucleus. In addition, the effects of carbon and substrate on the formation of Si-NCs were discussed. The work suggested that fcc-structured Si-NCs were readily generated in the surface layer of Si-rich SiC thin films.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2012.10.197

Additional details

Identifiers

DOI
10.1016/j.apsusc.2012.10.197;
PII
S0169-4332(12)01953-8;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
265
Journal Page Range
p. 286-290
ISSN
0169-4332
CODEN
ASUSEE

Optional Information

Copyright
Copyright (c) 2012 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.