Published 1986 | Version v1
Book

Damage resistance and crystal growth of KDP

  • 1. Lawrence Livermore National Lab., Univ. of California, P.O. Box 5508, L-490, Livermore, CA (USA)

Description

An investigation is reported of the dependence of laser-damage site density on fluence and on various parameters of crystal growth and post-growth treatment. Damage site density (number of defects per unit volume) was found to increase monotonically with fluence (for single 1-ns pulses of 1.06 μm laser light). Site density (at a fluence of 10 J/cm/sup 2/) was influenced by solution flow rate, seed defect removal prior to growth, quaternary ammonium cations, and thermal cycling following growth. No dependence of damage susceptibility on growth rate was found over the range 3-30 mm/d. A model is presented which postulates the electrostatic adsorption of organic material onto the growing crystal surface and subsequent inclusion into the crystal. According to the model, damage occurs by absorption of light by inclusions of solution-wetted organic debris, resulting in pressure increase and hydraulic fracture of the surrounding crystal

Additional details

Publishing Information

Publisher
SPIE Society of Photo-Optical Instrumentation Engineers.
Imprint Place
Bellingham, WA (USA)
Imprint Title
Laser and nonlinear optical materials
Journal Page Range
p. 6-9.

Conference

Title
30. SPIE technical symposium on optics and optoelectronic engineering.
Dates
17-22 Aug 1986.
Place
San Diego, CA (USA).