Published April 2, 1985 | Version v1
Patent Metadata-only

Process for the selective removal of hydrogen sulfide from gaseous mixtures with strongly basic tertiary amino compounds

Creators

Description

The selective removal of H2S gas from a normally gaseous mixture containing H2S and CO2 is accomplished by contacting the gaseous mixture with an absorbent solution comprising a strongly basic tertiary amino compound having a pK /SUB a/ at 200 C. greater than 8.6 and a boiling point at 760 mm greater than 1800 C. whereby H2S is selectively absorbed from the mixture

Availability note (English)

U.S. Commissioner of Patents, Washington, D.C. 20231, USA, $.50.

Additional details

Publishing Information

Imprint Pagination
v p.
IPC:
Int. Cl. B01D 53/34.
IPC
Int. Cl. B01D 53/34.
Patent number
US patent document 4,508,692/A/

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
17012620
Subject category
S61: RADIATION PROTECTION AND DOSIMETRY;
Resource subtype / Literary indicator
Non-conventional Literature
Descriptors DEI
ABSORPTION; ADSORBENTS; ADSORPTION; AIR POLLUTION; AMINES; CARBON DIOXIDE; CONTROL; DESULFURIZATION; GASEOUS WASTES; HYDROGEN SULFIDES; SEPARATION PROCESSES
Descriptors DEC
CARBON COMPOUNDS; CARBON OXIDES; CHALCOGENIDES; CHEMICAL REACTIONS; HYDROGEN COMPOUNDS; ORGANIC COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; POLLUTION; SULFIDES; SULFUR COMPOUNDS; WASTES

Optional Information

Notes
PAT-APPL-339893.