Significant interplay effect of silicon dopants on electronic properties in graphene
Creators
- 1. Beijing Computational Science Research Centre, Beijing 100084 (China)
- 2. Laboratory for Quantum Engineering and Micro–Nano Energy Technology, Department of Physics, Xiangtan University, Xiangtan, Hunan 411105 (China)
- 3. Laboratory of Thin Film Materials, College of Materials Science and Engineering, Beijing University of Technology, Beijing 100124 (China)
Description
Using first-principles calculations, we have systematically studied the effects of the interplay between Si dopants in graphene. Four stable Si-pair doping configurations have been predicted and investigated. It is shown that the Si dopants tend to agglomerate in graphene. In particular, the band structures can be remarkably modulated by the doping sites of Si atoms in graphene. With the change of the Si–Si distance, the electronic structures can be widely tuned to exhibit isotropic, direction-dependent, and semiconducting properties. Based on this unique interplay effect, we reveal two ordered C–Si alloys, CSi and C3Si. It is found that CSi has an indirect band gap of 2.5 eV while C3Si still retains the Dirac features. Our results suggest that more remarkable electronic properties of graphene can be obtained by controllable tuning of the multi-doping of Si in graphene.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.physleta.2014.04.056Additional details
Identifiers
- DOI
- 10.1016/j.physleta.2014.04.056;
- PII
- S0375-9601(14)00427-7;
Publishing Information
- Journal Title
- Physics Letters. A
- Journal Volume
- 378
- Journal Issue
- 26-27
- Journal Page Range
- p. 1841-1844
- ISSN
- 0375-9601
- CODEN
- PYLAAG
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 46023870
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ATOMS; BINARY ALLOY SYSTEMS; CARBON COMPOUNDS; COMPUTERIZED SIMULATION; CONFIGURATION; DOPED MATERIALS; ELECTRONIC STRUCTURE; EV RANGE; GRAPHENE; SILICON ADDITIONS; SILICON ALLOYS; SILICON COMPOUNDS
- Descriptors DEC
- ALLOY SYSTEMS; ALLOYS; CARBON; ELEMENTS; ENERGY RANGE; MATERIALS; NONMETALS; SILICON ALLOYS; SIMULATION
Optional Information
- Copyright
- Copyright (c) 2014 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.