Published May 16, 2014 | Version v1
Journal article

Significant interplay effect of silicon dopants on electronic properties in graphene

  • 1. Beijing Computational Science Research Centre, Beijing 100084 (China)
  • 2. Laboratory for Quantum Engineering and Micro–Nano Energy Technology, Department of Physics, Xiangtan University, Xiangtan, Hunan 411105 (China)
  • 3. Laboratory of Thin Film Materials, College of Materials Science and Engineering, Beijing University of Technology, Beijing 100124 (China)

Description

Using first-principles calculations, we have systematically studied the effects of the interplay between Si dopants in graphene. Four stable Si-pair doping configurations have been predicted and investigated. It is shown that the Si dopants tend to agglomerate in graphene. In particular, the band structures can be remarkably modulated by the doping sites of Si atoms in graphene. With the change of the Si–Si distance, the electronic structures can be widely tuned to exhibit isotropic, direction-dependent, and semiconducting properties. Based on this unique interplay effect, we reveal two ordered C–Si alloys, CSi and C3Si. It is found that CSi has an indirect band gap of 2.5 eV while C3Si still retains the Dirac features. Our results suggest that more remarkable electronic properties of graphene can be obtained by controllable tuning of the multi-doping of Si in graphene.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.physleta.2014.04.056

Additional details

Identifiers

DOI
10.1016/j.physleta.2014.04.056;
PII
S0375-9601(14)00427-7;

Publishing Information

Journal Title
Physics Letters. A
Journal Volume
378
Journal Issue
26-27
Journal Page Range
p. 1841-1844
ISSN
0375-9601
CODEN
PYLAAG

Optional Information

Copyright
Copyright (c) 2014 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.