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Published 2024 | Version v1
Journal article

Effect of MoN on the structure and characteristics of MoN/ZrMoN bi-layer nitride films

  • 1. Department of Materials Science and Engineering, National Taiwan University of Science and Technology, Taipei 10607, Taiwan (China)
  • 2. Department of Mechanical Engineering, Lunghwa University of Science and Technology, Taoyuan 33306, Taiwan (China)
  • 3. Department of Mechanical and Mechatronic Engineering, National Taiwan Ocean University, Keelung 20224, Taiwan (China)
  • 4. Department of Industrial Education, National Taiwan Normal University, Taipei 10610, Taiwan (China)

Description

Multi-alloy-modified film is used to protect the surface of tools and components. MoN/ZrMoN bi-layer films are deposited by sputtering. The effect of the MoN deposition time and the DC power for the Zr target on the structure and mechanical performance of the coated films is studied. The ZrMoN films correspond to the (111), (200) and (220) crystal planes of the FCC (NaCl) structures. The diffraction peaks for the (111) plane gradually shift to lower 2h values as the Zr content is increased. For a MoN buffer layer with a thickness of ∼393 nm, the ZrMoN film has a hardness of 12.53 GPa and a coefficient of friction of 0.42. As the DC power for the Zr target is increased to 200 W, the e hardness and elastic recovery for the MoN/ZrMoN bi-layer films are 15.65 GPa and 67.70%, respectively, which are the maximum respective values. The experimental results show that these bi-layer films have good mechanical performance and adhesive strength. (author)

Additional details

Identifiers

Publishing Information

Journal Title
Bulletin of Materials Science
Journal Volume
47
Series
Article ID 063
Journal Page Range
[10 p.]
CODEN
BUMSDW