Published August 25, 2005
| Version v1
Journal article
PECVD of h-BN and c-BN films from boranedimethylamine as a single source precursor
Creators
- 1. Istituto di Chimica Inorganica e delle Superfici del C.N.R., Corso Stati Uniti 4, 35127 Padova (Italy)
- 2. Istituto per lo Studio dei Materiali Nanostrutturati del C.N.R., Via Salaria Km. 29.3, 00016 Monterotondo (Italy)
- 3. ICMAB/CSIC, Campus UAB, 08193 Bellaterra, Spain. Centro de Fisica Aplicada y Tecnologia Avanzada-UNAM A.P. 1-1010, Santiago de Queretaro, QRO, CP 76000 (Mexico)
Description
Boron nitride (BN) thin films have been successfully synthesised via low pressure plasma enhanced chemical vapour deposition (PECVD) by using boranedimethylamine, BH3NH(CH3)2, as a single source precursor in the temperature range 280-550 deg. C in a nitrogen-argon atmosphere. The plasma power was optimised with the aim of obtaining suitable cubic/hexagonal phase ratios. The annealing of the h-BN films at temperatures up to 1000 deg. C in a nitrogen atmosphere, at normal pressure, gave rise to a complete transformation into the cubic phase. FTIR measurements provided a suitable method for identifying the structure of BN films. UV-vis spectroscopy was carried out in order to investigate the optical behaviour of the films
Additional details
Identifiers
- DOI
- 10.1016/j.electacta.2004.10.095;
- PII
- S0013-4686(05)00509-8;
Publishing Information
- Journal Title
- Electrochimica Acta
- Journal Volume
- 50
- Journal Issue
- 23
- Journal Page Range
- p. 4600-4604
- ISSN
- 0013-4686
- CODEN
- ELCAAV
Conference
- Title
- Conference on nanotechnology and coatings for novel applications
- Acronym
- Euro Interfinish 2003
- Dates
- 23-24 Oct 2003
- Place
- Praglia (Italy)
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 38012130
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ANNEALING; ARGON; BORON NITRIDES; CHEMICAL VAPOR DEPOSITION; FOURIER TRANSFORMATION; INFRARED SPECTRA; NITROGEN; PLASMA; SPECTROSCOPY; TEMPERATURE RANGE 0400-1000 K; THIN FILMS
- Descriptors DEC
- BORON COMPOUNDS; CHEMICAL COATING; DEPOSITION; ELEMENTS; FILMS; FLUIDS; GASES; HEAT TREATMENTS; INTEGRAL TRANSFORMATIONS; NITRIDES; NITROGEN COMPOUNDS; NONMETALS; PNICTIDES; RARE GASES; SPECTRA; SURFACE COATING; TEMPERATURE RANGE; TRANSFORMATIONS
Optional Information
- Copyright
- Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.