Published November 2004 | Version v1
Journal article

Surface charge compensation for a highly charged ion emission microscope

  • 1. Lawrence Livermore National Laboratory, L 472, Livermore, California 94550 (United States)
  • 2. E.O. Lawrence Berkeley National Laboratory (United States)

Description

A surface charge compensation electron flood gun has been added to the Lawrence Livermore National Laboratory (LLNL) highly charged ion (HCI) emission microscope. HCI surface interaction results in a significant charge residue being left on the surface of insulators and semiconductors. This residual charge causes undesirable aberrations in the microscope images and a reduction of the time-of-flight (T-O-F) mass resolution when studying the surfaces of insulators and semiconductors. The benefits and problems associated with HCI microscopy and recent results of the electron flood gun-enhanced HCI microscope are discussed

Additional details

Identifiers

DOI
10.1016/j.ultramic.2004.06.008;
PII
S0304-3991(04)00144-5;

Publishing Information

Journal Title
Ultramicroscopy (Amsterdam)
Journal Volume
101
Journal Issue
2-4
Journal Page Range
p. 225-229
ISSN
0304-3991
CODEN
ULTRD6

Optional Information

Copyright
Copyright (c) 2004 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.