The production of CxHx-1 film using low pressure plasma CVD

In a practice experiment on ICF targets, a CH coating has been developed for the investigation of radiation-induced implosion. An ultra-high vacuum system has been constructed to coat CH layers. The system consists of a work chamber with ultimate vacuum of 5x10-6 Pa, a cleaning chamber with ultimate vacuum of 5x10-4 Pa, an RF generator of continuous power up to 300 W, and a 'bounce-plate' with 60 small pits, in which micro-spheres are located. Using hydrogen and trans-2-butene as reaction gases, CH is coated onto plate and sphere targets, with thickness 5-20 μm and mean smoothness 50 nm. Different deposition conditions have been studied in detail with Fourier Transform infrared and X-ray photoelectron spectroscopy. The stable lifetime of the CxHx-1 film and the density of the surface dangling bonds under different H2 flow rates and different in-situ treatment time with H+ are described. An effective method of decreasing the surface dangling bond density is to use a long H+ treatment time in-situ