Published 2015
| Version v1
Journal article
Generation and formation of metal ion beams on high-dose ion implanter
Creators
- 1. Institute of Applied Physics of NASU, Sumy (Ukraine)
Description
Installation for high-dose implantation of metal ions with energies of 20...500 keV was designed. Gas magnetron metal ion source of sputter type was used. Computer simulation of processes of ion beam extraction from plasma boundary of the ion source and beam transporting in the ion-optic system of the implanter was made. Mass-spectra of ion beams were obtained
Additional details
Additional titles
- Original title (Russian)
- Генерация и формирование пучков металлических ионов на высокодозном ионном имплантере
Publishing Information
- Journal Title
- Voprosy Atomnoj Nauki i Tekhniki
- Journal Issue
- no2-96
- Journal Page Range
- p. 204-209
- ISSN
- 1562-6016
INIS
- Country of Publication
- Ukraine
- Country of Input or Organization
- Ukraine
- INIS RN
- 46135710
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Descriptors DEI
- BEAM EXTRACTION; BEAM PRODUCTION; BEAM TRANSPORT; COMPUTERIZED SIMULATION; DESIGN; ION BEAMS; ION IMPLANTATION; ION SOURCES; IRRADIATION DEVICES; KEV RANGE 100-1000; KEV RANGE 10-100; MAGNETRONS; MASS SPECTRA; OPTIMIZATION
- Descriptors DEC
- BEAMS; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ENERGY RANGE; EQUIPMENT; KEV RANGE; MICROWAVE EQUIPMENT; MICROWAVE TUBES; SIMULATION; SPECTRA