Annealing effects on microstructure and mechanical properties of chromium oxide coatings
Creators
- 1. Department of Mechanical Engineering, University of South Florida, Tampa, FL 33620 (United States)
- 2. Department of Materials Physics and Chemistry, University of Science and Technology Beijing, Beijing 100083 (China)
Description
Reactive radio frequency magnetron sputter-deposited chromium oxide coatings were annealed at different temperatures and times. The influence of annealing temperature on the microstructure, surface morphology and mechanical properties was examined by X-ray diffraction, nanoindentation, pin-on-disc wear and scratch tests, respectively. X-ray results show that the chromium oxide sputtered at room temperature in low oxygen flux is primarily amorphous. Annealing below 400 deg. C did not cause much change, while annealing at higher temperature of 500 deg. C caused a significant change in microstructure and mechanical properties. Hardness increased from 12.3 GPa to 26 GPa, and the wearability improved with higher annealing temperature due to the formation of crystalline Cr2O3 phase, which occurs at 470 deg. C. Annealing time had little effect on mechanical properties and microstructure, although coating surface roughness increased with a longer annealing time. Coating adhesion was improved by annealing, due to residual stress relief and possible interfacial interdiffusion
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2007.08.083Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2007.08.083;
- PII
- S0040-6090(07)01455-1;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 516
- Journal Issue
- 15
- Journal Page Range
- p. 4685-4689
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 40005681
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ANNEALING; CHROMIUM OXIDES; COATINGS; HARDNESS; MAGNETRONS; MICROSTRUCTURE; MORPHOLOGY; PRESSURE RANGE GIGA PA; RESIDUAL STRESSES; SPUTTERING; SURFACE COATING; TEMPERATURE RANGE 0273-0400 K; TEMPERATURE RANGE 0400-1000 K; WEAR RESISTANCE; X-RAY DIFFRACTION
- Descriptors DEC
- CHALCOGENIDES; CHROMIUM COMPOUNDS; COHERENT SCATTERING; DEPOSITION; DIFFRACTION; ELECTRON TUBES; ELECTRONIC EQUIPMENT; EQUIPMENT; HEAT TREATMENTS; MECHANICAL PROPERTIES; MICROWAVE EQUIPMENT; MICROWAVE TUBES; OXIDES; OXYGEN COMPOUNDS; PRESSURE RANGE; SCATTERING; STRESSES; TEMPERATURE RANGE; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2007 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.