Published March 12, 2010
| Version v1
Journal article
Nonvolatile memory devices based on few-layer graphene films
Creators
- 1. Department of Display and Semiconductor Physics, Sejong Campus, Korea University, Chungnam-Do 339-800 (Korea, Republic of)
- 2. Department of Physics and Astronomy and National Creative Research Initiative Center for Semiconductor Nanorods, Seoul National University, Seoul 151-747 (Korea, Republic of)
Description
We report on the electrical characteristics of few-layer graphene (FLG) field-effect devices with their various thicknesses. In combination with a ferroelectric polymer layer of poly(vinylidene fluoride/trifluoroethylene) [P(VDF/TrFE)], FLG/ferroelectric devices exhibited nonvolatile resistance changes due to a polarization switching of the P(VDF/TrFE) layer. The bistability and retention properties were highly sensitive to the FLG thickness, which is attributed to a charge screening effect in FLG films.
Availability note (English)
Available from http://dx.doi.org/10.1088/0957-4484/21/10/105204Additional details
Identifiers
- DOI
- 10.1088/0957-4484/21/10/105204;
- PII
- S0957-4484(10)32555-4;
Publishing Information
- Journal Title
- Nanotechnology (Print)
- Journal Volume
- 21
- Journal Issue
- 10
- Journal Page Range
- [5 p.]
- ISSN
- 0957-4484
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 43022147
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Descriptors DEI
- FERROELECTRIC MATERIALS; FILMS; FLUORINATED ALIPHATIC HYDROCARBONS; LAYERS; MEMORY DEVICES; NANOSTRUCTURES; POLARIZATION; RETENTION; THICKNESS
- Descriptors DEC
- DIELECTRIC MATERIALS; DIMENSIONS; HALOGENATED ALIPHATIC HYDROCARBONS; MATERIALS; ORGANIC COMPOUNDS; ORGANIC FLUORINE COMPOUNDS; ORGANIC HALOGEN COMPOUNDS