Published November 2021 | Version v1
Journal article

Conduction mechanism effect on physical unclonable function using Al2O3/TiOX memristors

  • 1. Department of Electronic Engineering, Inha University, Incheon 22212, South (Korea, Republic of)
  • 2. Department of Electrical and Computer Engineering, Seoul National University, Seoul 08826, South (Korea, Republic of)
  • 3. Keysight Technologies, Santa Rosa, CA 95403 (United States)

Description

In this study, we evaluate the performance of a physical unclonable function (PUF) using Al2O3/TiOx based memristors. Through a conduction mechanism analysis, it is confirmed that the distribution of high-resistance state (HRS) is wider than that of low-resistance state (LRS) due to the direct-tunneling gap. Furthermore, cycle-to-cycle variation and random telegraph noise (RTN) characteristics which can affect the reliability of the PUF are also analyzed. Since the switching characteristics of the devices are less affected by temperature in the LRS thanks to ohmic conduction, the device state of a whole array is determined as the LRS for a better reliability. In addition, three kinds of response extraction methods are compared by evaluating the diffuseness and uniqueness with 2 × 2 switch block for the improved randomness. Finally, the reliability of the PUF is verified considering the measured conductance dependency on temperature and noise effect, and the bit error rates are compared between two states.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.chaos.2021.111388

Additional details

Identifiers

DOI
10.1016/j.chaos.2021.111388;
PII
S0960077921007426;

Publishing Information

Journal Title
Chaos, Solitons and Fractals
Journal Volume
152
Journal Page Range
vp.
ISSN
0960-0779

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
53100323
Subject category
S36: MATERIALS SCIENCE; S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
Descriptors DEI
ALUMINIUM OXIDES; ERRORS; PERFORMANCE; TUNNEL EFFECT
Descriptors DEC
ALUMINIUM COMPOUNDS; CHALCOGENIDES; OXIDES; OXYGEN COMPOUNDS

Optional Information

Copyright
Copyright (c) 2021 Elsevier Ltd. All rights reserved.