Conduction mechanism effect on physical unclonable function using Al2O3/TiOX memristors
- 1. Department of Electronic Engineering, Inha University, Incheon 22212, South (Korea, Republic of)
- 2. Department of Electrical and Computer Engineering, Seoul National University, Seoul 08826, South (Korea, Republic of)
- 3. Keysight Technologies, Santa Rosa, CA 95403 (United States)
Description
In this study, we evaluate the performance of a physical unclonable function (PUF) using Al2O3/TiOx based memristors. Through a conduction mechanism analysis, it is confirmed that the distribution of high-resistance state (HRS) is wider than that of low-resistance state (LRS) due to the direct-tunneling gap. Furthermore, cycle-to-cycle variation and random telegraph noise (RTN) characteristics which can affect the reliability of the PUF are also analyzed. Since the switching characteristics of the devices are less affected by temperature in the LRS thanks to ohmic conduction, the device state of a whole array is determined as the LRS for a better reliability. In addition, three kinds of response extraction methods are compared by evaluating the diffuseness and uniqueness with 2 × 2 switch block for the improved randomness. Finally, the reliability of the PUF is verified considering the measured conductance dependency on temperature and noise effect, and the bit error rates are compared between two states.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.chaos.2021.111388Additional details
Identifiers
- DOI
- 10.1016/j.chaos.2021.111388;
- PII
- S0960077921007426;
Publishing Information
- Journal Title
- Chaos, Solitons and Fractals
- Journal Volume
- 152
- Journal Page Range
- vp.
- ISSN
- 0960-0779
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 53100323
- Subject category
- S36: MATERIALS SCIENCE; S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Descriptors DEI
- ALUMINIUM OXIDES; ERRORS; PERFORMANCE; TUNNEL EFFECT
- Descriptors DEC
- ALUMINIUM COMPOUNDS; CHALCOGENIDES; OXIDES; OXYGEN COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2021 Elsevier Ltd. All rights reserved.