Chamber and Wall Response to Target Implosion in Inertial and Z-Pinch Fusion and Lithography Devices

The chamber walls, both solid and liquid, in inertial fusion energy (IFE) and Z-pinch reactors and Lithography devices are exposed to harsh conditions following each target implosion or pinching of plasma. Key issues of the cyclic IFE operation include intense photon and ion deposition, wall thermal and hydrodynamic evolution, wall erosion and fatigue lifetime, and chamber clearing and evacuation to ensure desirable conditions prior to target implosion. Detailed models have been developed for reflected laser light, emitted photons, neutrons, and target debris deposition and interaction with chamber components and have been implemented in the comprehensive HEIGHTS software package. The hydrodynamic response of chamber walls in bare or in gas-filled cavities and the photon transport of the deposited energy has been calculated by means of new and advanced numerical techniques for accurate shock treatment and propagation. These models include detail media hydrodynamics, non-LTE multi-group for both continuum and line radiation transport, and dynamics of eroded debris resulting from the intense energy deposition. The focus of this study is to critically assess the reliability and the dynamic response of chamber walls in various proposed protection methods for IFE systems. Key requirements are that: (i) the chamber wall accommodates the cyclic energy deposition while providing the required lifetime due to various erosion mechanisms, such as vaporization, chemical and physical sputtering, melt/liquid splashing and explosive erosion, and fragmentation of liquid walls, and (ii) after each shot the chamber is cleared and returned to a quiescent state in preparation for the target injection and the firing of the driver for the subsequent shot. This paper investigates in details these two important issues and found that the required operating frequency of the IFE reactors for power production may be severely limited due to these two requirements. (author)