Published April 15, 2009 | Version v1
Journal article

Electroless Ni-Cu-P plating onto open cell stainless steel foam

  • 1. Central Metallurgical Research and Development Institute (CMRDI), P.O. 87, Helwan, Cairo (Egypt)
  • 2. Ecole Nationale Superieure de Chimie de Paris, Lab de Physico-Chimie de Surfaces UMR-CNRS 7045, 11, rue Pierre et Marie Curie, 75005 Paris (France)
  • 3. Center of Excellence for Research in Engineering Materials, Faculty of Engineering, King Saud University, P.O. Box 800, Riadh 11421 (Saudi Arabia)

Description

Metallic foams with a high fraction of porosity, low density and high energy absorption capacity, are a rapidly emerging class of novel ultralightweight materials for various engineering applications. Development of these materials with Ni-Cu-P coatings is expected to widespread their industrial utilizations. This article aims to apply Ni-Cu-P coatings onto open cell stainless steel foams from Ni-P bath containing CuSO4.5H2O as a source of Cu ions. Scanning electron microscopy and energy dispersive analysis were used to investigate the microstructure and chemical composition of the deposited coatings, respectively. The influence of CuSO4.5H2O addition on the deposition rate, chemical composition and surface morphology of coatings was studied. The corrosion performance of coated foam was examined in 1 M HCl using weight loss technique. The results revealed that wt.% of Cu in deposit increases with CuSO4.5H2O concentration, while wt.% of Ni and P is reduced. Better corrosion resistance, finer-grained deposit and lower deposition rate were observed by increasing Cu content into Ni-P matrix.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2009.02.073

Additional details

Identifiers

DOI
10.1016/j.apsusc.2009.02.073;
PII
S0169-4332(09)00225-6;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
255
Journal Issue
13-14
Journal Page Range
p. 6652-6655
ISSN
0169-4332
CODEN
ASUSEE

Optional Information

Copyright
Copyright (c) 2009 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.