Combinatorial fabrication and magnetic properties of homoepitaxial Co and Li co-doped NiO thin-film nanostructures
- 1. Department of Physics, School of Sciences, Gujarat University, Ahmedabad 380 009 (India)
- 2. Institute of Solid State Physics, University of Tokyo, Kashiwa, Kashiwanoha, Chiba 277-8581 (Japan)
- 3. Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagastuta, Midoriku, 226-8503, Yokohama (Japan)
- 4. CREST, Japan Science and Technology Corporation (JST), 4-1-8 Honcho, Kawaguchi 332-0012 (Japan)
Description
Magnetic properties of nanostructured epitaxial thin layers of a series of Co and Li co-doped NiO on MgO(1 0 0) substrate with NiO buffer layer have been investigated. Thin films were synthesized by combinatorial laser molecular beam epitaxy (CLMBE) in the continuous binary composition spread approach. Large and linear variation of x was achieved in the growth of CoxLi0.2Ni0.8-xO, onto 9 mm of single substrate. Homoepitaxial growth with smooth surface morphology was confirmed by grazing incidence X-ray diffraction (GIXRD) and atomic force microscopy (AFM). Linear decrease in the band gap and optical transparency was observed with increasing cobalt concentration. The magneto-optical Kerr effect revealed a strong photon energy dependency with negative Kerr rotation for all the Co-concentrations in the film, suggesting intra-valence charge transfer (IVCT) between low spin state Co2+ with host Ni2+. Ferromagnetic (FM)-like ordering was observed at low temperatures, while antiferromagnetism predominates at room temperature in the Co and Li co-doped nickel oxide epitaxial films.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.jmmm.2009.06.081Additional details
Identifiers
- DOI
- 10.1016/j.jmmm.2009.06.081;
- PII
- S0304-8853(09)00699-4;
Publishing Information
- Journal Title
- Journal of Magnetism and Magnetic Materials
- Journal Volume
- 321
- Journal Issue
- 21
- Journal Page Range
- p. 3595-3599
- ISSN
- 0304-8853
- CODEN
- JMMMDC
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 41010077
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Descriptors DEI
- ATOMIC FORCE MICROSCOPY; COBALT COMPOUNDS; COBALT IONS; DOPED MATERIALS; ENERGY BEAM DEPOSITION; FABRICATION; KERR EFFECT; LASER RADIATION; LAYERS; LITHIUM COMPOUNDS; MAGNESIUM OXIDES; MAGNETIC PROPERTIES; MAGNETIC SEMICONDUCTORS; MOLECULAR BEAM EPITAXY; MORPHOLOGY; NANOSTRUCTURES; NICKEL IONS; NICKEL OXIDES; TEMPERATURE RANGE 0273-0400 K; THIN FILMS; X-RAY DIFFRACTION
- Descriptors DEC
- ALKALI METAL COMPOUNDS; ALKALINE EARTH METAL COMPOUNDS; CHALCOGENIDES; CHARGED PARTICLES; COHERENT SCATTERING; CRYSTAL GROWTH METHODS; DEPOSITION; DIELECTRIC PROPERTIES; DIFFRACTION; ELECTRICAL PROPERTIES; ELECTROMAGNETIC RADIATION; EPITAXY; FILMS; IONS; MAGNESIUM COMPOUNDS; MATERIALS; MICROSCOPY; NICKEL COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; RADIATIONS; SCATTERING; SEMICONDUCTOR MATERIALS; SURFACE COATING; TEMPERATURE RANGE; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2009 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.