Published August 1987 | Version v1
Report Metadata-only

Correlation between plasma parameters and the deposition of μC-Si films by plasma of argon and hydrogen

Creators

  • 1. Israel Atomic Energy Commission, Tel Aviv
  • 2. Ben-Gurion Univ. of the Negev, Beersheba (Israel)

Description

Published in summary form only

Additional details

Publishing Information

Imprint Title
Research laboratories annual report 1986
Imprint Pagination
286 p.
Journal Page Range
p. 48.
Report number
IA--1427

INIS

Country of Publication
Israel
Country of Input or Organization
Israel
INIS RN
19015067
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY; S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
No Abstract
Descriptors DEI
CORRELATIONS; DEPOSITION; DISSOCIATION; FILMS; PLASMA; REACTION KINETICS; SILANES; SILICON; SUBSTRATES
Descriptors DEC
ELEMENTS; HYDRIDES; HYDROGEN COMPOUNDS; KINETICS; SEMIMETALS; SILICON COMPOUNDS