Optical Protection Filters for Harmful Laser Beams and UV Radiation

Due to the rapid growth of radiation protection applications in various devices and instruments, it is essential to use suitable filters for eye protection of the personal working in the radiation field. Different protection filters were produced to protect from four laser beam wavelengths (at 532nm, 632.8nm, 694nm and 1064nm) and block three UV bands (UVA, UVB, and UVC). The design structure of the required dielectric multilayer filters used optical thin film technology. The computer analyses of the multilayer filter formulas were prepared using Macleod Software for the production filter processes. The deposition technique was achieved on optical substrates (Glass BK-7 and Infrasil 301) by dielectric material combinations including Dralo (mixture of oxides TiO2/Al2O3), and Lima (mixture of oxides SiO2/Al2O3); deposition by an electron beam gun. The output transmittance curves for both theoretical and experimental values of all filters are presented. To validate the suitability for use in a 'real world', rather than laboratory test application, full environmental assessment was also carried out. These filters exhibited high endurance after exposing them to the durability tests (adhesion, abrasion resistance and humidity) according to military standards MIL-C-675C and MIL-C-48497A